Precision in Every Thin Film
JP Analytical delivers trusted metrology and R&D solutions tailored for semiconductor innovation.
Rated 4.9 stars
★★★★★
Who We Are
JP Analytical is a precision thin-film metrology and semiconductor R&D partner delivering quantitative, physics-based insight into advanced materials and devices. Through specialized characterization, defect passivation, thermal processing, and tailored research programs, we help innovators move from complex materials challenges to scalable technology with confidence.
Our Services
Precision thin film metrology and semiconductor R&D tailored for your needs
Thin Film Analysis
Get precise measurements of film thickness and composition with our tailored Thin Film Metrology solutions. Enhance material performance through accelerator-based ion beam materials modification and analysis, ensuring optimal results for your applications.
Semiconductor R&D
Innovative Semiconductor R&D Solutions
Accelerating advanced materials and device development through precision metrology, defect engineering, and tailored research strategies.
Ion Beam Analysis
Ion Beam Analysis (IBA) provides precise, non-destructive quantitative measurement of elemental composition, depth profiles, and thin-film properties with high sensitivity and minimal sample preparation.
RBS
Rutherford Backscattering Spectrometry (RBS) is a non-destructive ion beam analysis technique that provides quantitative elemental composition, thickness, and depth profiling of thin films and materials.
HFS and ERDA
ERDA/HFS is a quantitative ion beam analysis technique that enables sensitive, non-destructive depth profiling of hydrogen and other light elements in thin films and advanced materials.
Nuclear Reaction Analysis (NRA) enables highly selective and quantitative detection of hydrogen and deuterium in thin films by measuring reaction products from the 2H(3He,p)α
NRA for Light Elements
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